Silicon dioxide
Mesoporous, particle size: 2μm, pore size: 4nm
- Product Code: 236398
CAS:
60676-86-0
| Molecular Weight: | 60.08 g./mol | Molecular Formula: | SiO₂ |
|---|---|---|---|
| EC Number: | 262-373-8 | MDL Number: | MFCD00011232 |
| Melting Point: | 1670°C | Boiling Point: | |
| Density: | Storage Condition: | Room temperature |
Product Description:
Used as a flow agent in powdered foods like spices and non-dairy creamers to prevent caking.
Commonly added to pharmaceuticals as an anti-caking agent in tablets and powders.
Serves as a desiccant in moisture-absorbing packets for electronics and food packaging.
Acts as a thickening and suspending agent in paints, coatings, and inks.
Widely used in cosmetics and skincare products for its absorbent and texturizing properties.
Functions as a reinforcing filler in rubber and silicone products.
Employed in water filtration systems due to its porous structure and high surface area.
Used in the production of glass, ceramics, and cement as a key structural component.
Applied in semiconductor manufacturing as an insulating layer in integrated circuits.
Utilized in chromatography as a stationary phase for separating chemical compounds.
Sizes / Availability / Pricing:
| Size | Availability | Price | Quantity |
|---|---|---|---|
| 1g | 10-20 days | ฿12,560.00 |
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Silicon dioxide
Used as a flow agent in powdered foods like spices and non-dairy creamers to prevent caking.
Commonly added to pharmaceuticals as an anti-caking agent in tablets and powders.
Serves as a desiccant in moisture-absorbing packets for electronics and food packaging.
Acts as a thickening and suspending agent in paints, coatings, and inks.
Widely used in cosmetics and skincare products for its absorbent and texturizing properties.
Functions as a reinforcing filler in rubber and silicone products.
Employed in water filtration systems due to its porous structure and high surface area.
Used in the production of glass, ceramics, and cement as a key structural component.
Applied in semiconductor manufacturing as an insulating layer in integrated circuits.
Utilized in chromatography as a stationary phase for separating chemical compounds.
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