Tetraethylsilane
≥99%(GC)
- Product Code: 238124
CAS:
631-36-7
| Molecular Weight: | 144.33 g./mol | Molecular Formula: | C₈H₂₀Si |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD00009019 | |
| Melting Point: | -82.5 °C(lit.) | Boiling Point: | 153-154 °C(lit.) |
| Density: | 0.761 g/mL at 25 °C (lit.) | Storage Condition: | Room temperature, seal, dry |
Product Description:
Used as a precursor in the production of silicon-based materials, especially in semiconductor manufacturing and thin-film deposition processes. It serves as a source of elemental silicon in chemical vapor deposition (CVD), where it decomposes at high temperatures to form pure silicon layers on substrates. Also employed in the synthesis of silica nanoparticles and silicon carbide due to its ability to release ethyl groups upon thermal breakdown, facilitating controlled reactions. Its volatility and reactivity make it suitable for use in specialized organic synthesis and as a reagent in the development of silane-based polymers and coatings.
Sizes / Availability / Pricing:
| Size | Availability | Price | Quantity |
|---|---|---|---|
| 5ml | 10-20 days | $57.07 |
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| 25ml | 10-20 days | $229.07 |
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| 100ml | 10-20 days | $747.46 |
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Tetraethylsilane
Used as a precursor in the production of silicon-based materials, especially in semiconductor manufacturing and thin-film deposition processes. It serves as a source of elemental silicon in chemical vapor deposition (CVD), where it decomposes at high temperatures to form pure silicon layers on substrates. Also employed in the synthesis of silica nanoparticles and silicon carbide due to its ability to release ethyl groups upon thermal breakdown, facilitating controlled reactions. Its volatility and reactivity make it suitable for use in specialized organic synthesis and as a reagent in the development of silane-based polymers and coatings.
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