Trisilane
- Product Code: 238524
CAS:
7783-26-8
| Molecular Weight: | 92.32 g./mol | Molecular Formula: | H₈Si₃ |
|---|---|---|---|
| EC Number: | MDL Number: | ||
| Melting Point: | -117.4 °C | Boiling Point: | |
| Density: | Storage Condition: | 2-8°C |
Product Description:
Used in semiconductor manufacturing as a silicon precursor for depositing silicon-containing films via chemical vapor deposition (CVD). It enables low-temperature deposition processes, making it suitable for advanced microelectronics and thin-film applications. Also explored in the synthesis of silicon-based nanomaterials and as a reagent in specialty chemical reactions requiring high reactivity.
Sizes / Availability / Pricing:
| Size | Availability | Price | Quantity |
|---|---|---|---|
| 1g | 10-20 days | $6,396.37 |
+
-
|
Trisilane
Used in semiconductor manufacturing as a silicon precursor for depositing silicon-containing films via chemical vapor deposition (CVD). It enables low-temperature deposition processes, making it suitable for advanced microelectronics and thin-film applications. Also explored in the synthesis of silicon-based nanomaterials and as a reagent in specialty chemical reactions requiring high reactivity.
| Mechanism | - |
| Appearance | - |
| Longevity | - |
| Strength | - |
| Storage | - |
| Shelf Life | - |
| Allergen(s) | - |
| Dosage (Range) | - |
| Recommended Dosage | - |
| Dosage (Per Day) | - |
| Recommended Dosage (Per Day) | - |
| Mix Method | - |
| Heat Resistance | - |
| Stable in pH range | - |
| Solubility | - |
| Product Types | - |
| INCI | - |
Purchase History for
Loading purchase history...
Cart
No products
Subtotal:
$0.00
$0.00
Total :