Trimethylgallium

  • Product Code: 238525
  CAS:    1445-79-0
Molecular Weight: 114.83 g./mol Molecular Formula: C₃H₉GA
EC Number: MDL Number: MFCD00014841
Melting Point: Boiling Point:
Density: Storage Condition: Room temperature
Product Description: Used primarily as a precursor in metal-organic chemical vapor deposition (MOCVD) for growing gallium-containing semiconductor layers. Essential in the production of high-performance electronic and optoelectronic devices such as light-emitting diodes (LEDs), laser diodes, and high-frequency transistors. Enables precise control of gallium incorporation in compound semiconductors like gallium nitride (GaN) and gallium arsenide (GaAs). Its high reactivity and volatility make it suitable for thin-film deposition at moderate temperatures, supporting advancements in solid-state lighting, power electronics, and telecommunications.
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Size Availability Price Quantity
1g 10-20 days ฿20,640.00
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Trimethylgallium
Used primarily as a precursor in metal-organic chemical vapor deposition (MOCVD) for growing gallium-containing semiconductor layers. Essential in the production of high-performance electronic and optoelectronic devices such as light-emitting diodes (LEDs), laser diodes, and high-frequency transistors. Enables precise control of gallium incorporation in compound semiconductors like gallium nitride (GaN) and gallium arsenide (GaAs). Its high reactivity and volatility make it suitable for thin-film deposition at moderate temperatures, supporting advancements in solid-state lighting, power electronics, and telecommunications.
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