Tris(dimethylamino)phenylsilane
97%
- Product Code: 238536
CAS:
4840-75-9
| Molecular Weight: | 237.417 g./mol | Molecular Formula: | C₁₂H₂₃N₃Si |
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| EC Number: | MDL Number: | ||
| Melting Point: | <0 °C | Boiling Point: | 143 °C |
| Density: | Storage Condition: | 2-8°C |
Product Description:
Used as a precursor in semiconductor manufacturing, particularly in chemical vapor deposition (CVD) processes to form silicon-containing thin films. Its high reactivity and volatility allow for efficient deposition at lower temperatures, making it suitable for advanced microelectronics fabrication. Also employed in the synthesis of specialty siloxane polymers and surface modification agents due to its amine-functional groups, which enhance adhesion and compatibility with various substrates.
Sizes / Availability / Pricing:
| Size | Availability | Price | Quantity |
|---|---|---|---|
| 1g | 10-20 days | ฿11,920.00 |
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Tris(dimethylamino)phenylsilane
Used as a precursor in semiconductor manufacturing, particularly in chemical vapor deposition (CVD) processes to form silicon-containing thin films. Its high reactivity and volatility allow for efficient deposition at lower temperatures, making it suitable for advanced microelectronics fabrication. Also employed in the synthesis of specialty siloxane polymers and surface modification agents due to its amine-functional groups, which enhance adhesion and compatibility with various substrates.
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