Tetrakis(dimethylamino)zirconium
Electronic grade, ≥99.99% trace metals basis
- Product Code: 238730
CAS:
19756-04-8
| Molecular Weight: | 267.53 g./mol | Molecular Formula: | C₈H₂₄N₄Zr |
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| Density: | Storage Condition: | 2-8℃, drying, inert gas storage |
Product Description:
Used as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes for fabricating zirconium-containing thin films. These films serve as high-k dielectrics in semiconductor devices, offering excellent insulating properties and thermal stability. The compound’s high volatility and reactivity make it suitable for low-temperature deposition, enabling integration into advanced microelectronic manufacturing. It is also explored in catalysis and materials synthesis where controlled release of zirconium is required.
Sizes / Availability / Pricing:
| Size | Availability | Price | Quantity |
|---|---|---|---|
| 250mg | 10-20 days | $231.33 |
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Tetrakis(dimethylamino)zirconium
Used as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes for fabricating zirconium-containing thin films. These films serve as high-k dielectrics in semiconductor devices, offering excellent insulating properties and thermal stability. The compound’s high volatility and reactivity make it suitable for low-temperature deposition, enabling integration into advanced microelectronic manufacturing. It is also explored in catalysis and materials synthesis where controlled release of zirconium is required.
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