Tetra-Sec-Butoxysilane
97%
- Product Code: 241291
CAS:
5089-76-9
| Molecular Weight: | 320.54 g./mol | Molecular Formula: | C₁₆H₃₆O₄Si |
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| Density: | Storage Condition: | Room temperature |
Product Description:
Used as a precursor in the production of silica-based thin films and coatings through sol-gel processes. It is particularly effective in chemical vapor deposition (CVD) and spin-coating applications, where it helps form uniform, high-purity dielectric layers on semiconductor devices. Due to its reactivity and ability to generate silica at relatively low temperatures, it is favored in microelectronics for insulating layers and in optical coatings for its clarity and durability. Also employed in the synthesis of hybrid organic-inorganic materials and aerogels, where controlled hydrolysis leads to porous structures with thermal insulation properties.
Sizes / Availability / Pricing:
| Size | Availability | Price | Quantity |
|---|---|---|---|
| 25.000 G | 10-20 days | ฿3,290.00 |
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| 100.000 G | 10-20 days | ฿12,660.00 |
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| 500.000 G | 10-20 days | ฿53,600.00 |
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Tetra-Sec-Butoxysilane
Used as a precursor in the production of silica-based thin films and coatings through sol-gel processes. It is particularly effective in chemical vapor deposition (CVD) and spin-coating applications, where it helps form uniform, high-purity dielectric layers on semiconductor devices. Due to its reactivity and ability to generate silica at relatively low temperatures, it is favored in microelectronics for insulating layers and in optical coatings for its clarity and durability. Also employed in the synthesis of hybrid organic-inorganic materials and aerogels, where controlled hydrolysis leads to porous structures with thermal insulation properties.
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