2,4,6-Triisopropylbenzoic acid
97%
- Product Code: 241658
CAS:
49623-71-4
| Molecular Weight: | 248.36 g./mol | Molecular Formula: | C₁₆H₂₄O₂ |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD00015031 | |
| Melting Point: | 186-187°C | Boiling Point: | 318.7°C at 760 mmHg |
| Density: | Storage Condition: | Room temperature, dry seal |
Product Description:
Used as a key intermediate in the synthesis of photoacid generators (PAGs), particularly in advanced semiconductor photolithography processes. Its bulky aromatic structure enhances thermal stability and influences acid diffusion control in chemically amplified resists, improving resolution in microfabrication. Also employed in the preparation of specialty esters and catalysts due to its steric hindrance and solubility properties.
Sizes / Availability / Pricing:
| Size | Availability | Price | Quantity |
|---|---|---|---|
| 1g | 10-20 days | ฿1,160.00 |
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| 5g | 10-20 days | ฿5,700.00 |
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| 10g | 10-20 days | ฿10,990.00 |
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| 25g | 10-20 days | ฿26,980.00 |
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| 100g | 10-20 days | ฿99,990.00 |
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2,4,6-Triisopropylbenzoic acid
Used as a key intermediate in the synthesis of photoacid generators (PAGs), particularly in advanced semiconductor photolithography processes. Its bulky aromatic structure enhances thermal stability and influences acid diffusion control in chemically amplified resists, improving resolution in microfabrication. Also employed in the preparation of specialty esters and catalysts due to its steric hindrance and solubility properties.
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