Zirconium(IV) chloride
99.5%, hafnium chloride
- Product Code: 246667
CAS:
10026-11-6
| Molecular Weight: | 233.04 g./mol | Molecular Formula: | ZrCl₄ |
|---|---|---|---|
| EC Number: | 233-058-2 | MDL Number: | MFCD00011306 |
| Melting Point: | 437 °C | Boiling Point: | |
| Density: | 2.8 g/mL at 25 °C(lit.) | Storage Condition: | Room temperature, inert gas |
Product Description:
Used as a precursor in the production of zirconium metal and various zirconium-based compounds. Commonly employed in organic synthesis as a Lewis acid catalyst, particularly in Friedel-Crafts reactions and other carbon-carbon bond-forming reactions. Plays a role in the preparation of catalysts for polymerization of olefins. Utilized in the manufacturing of refractory materials and specialty ceramics due to its high thermal stability. Also finds use in the electronics industry for depositing zirconium-containing thin films through chemical vapor deposition (CVD) processes.
Sizes / Availability / Pricing:
| Size | Availability | Price | Quantity |
|---|---|---|---|
| 5.000 | 10-20 days | ฿600.00 |
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| 25.000 | 10-20 days | ฿1,490.00 |
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| 100.000 | 10-20 days | ฿4,190.00 |
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| 500.000 | 10-20 days | ฿12,190.00 |
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| 1000.000 | 10-20 days | ฿22,560.00 |
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Zirconium(IV) chloride
Used as a precursor in the production of zirconium metal and various zirconium-based compounds. Commonly employed in organic synthesis as a Lewis acid catalyst, particularly in Friedel-Crafts reactions and other carbon-carbon bond-forming reactions. Plays a role in the preparation of catalysts for polymerization of olefins. Utilized in the manufacturing of refractory materials and specialty ceramics due to its high thermal stability. Also finds use in the electronics industry for depositing zirconium-containing thin films through chemical vapor deposition (CVD) processes.
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