Bis(t-butylimido)bis(dimethylamino)tungsten(VI)
99%(99.99%-W)
- Product Code: 54647
CAS:
406462-43-9
Molecular Weight: | 414.24 g./mol | Molecular Formula: | C₁₂H₃₀N₄W |
---|---|---|---|
EC Number: | MDL Number: | MFCD07369712 | |
Melting Point: | Boiling Point: | 81℃0.02 mm Hg(lit.) | |
Density: | 1.305 g/mL at 25℃(lit.) | Storage Condition: | 2-8℃ |
Product Description:
Used in chemical vapor deposition (CVD) processes to produce thin films of tungsten or tungsten compounds, essential in semiconductor manufacturing. Acts as a precursor for creating high-purity tungsten layers in microelectronics and integrated circuits. Also employed in the synthesis of specialized materials for advanced coatings and catalysts. Its stability and reactivity make it suitable for precise deposition in nanotechnology applications.
Product Specification:
Test | Specification |
---|---|
APPEARANCE | Faint Yellow to Very Dark Yellow andFaint Orange to Very Dark Orange Liquid |
PURITY | 98.5-100 |
Infrared spectrum | Conforms to Structure |
NMR | Conforms to Structure |
Sizes / Availability / Pricing:
Size (g) | Availability | Price | Quantity |
---|---|---|---|
1.000 | 10-20 days | ฿15,750.00 |
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Bis(t-butylimido)bis(dimethylamino)tungsten(VI)
Used in chemical vapor deposition (CVD) processes to produce thin films of tungsten or tungsten compounds, essential in semiconductor manufacturing. Acts as a precursor for creating high-purity tungsten layers in microelectronics and integrated circuits. Also employed in the synthesis of specialized materials for advanced coatings and catalysts. Its stability and reactivity make it suitable for precise deposition in nanotechnology applications.
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