Tungsten silicide
-325 eyes, 99.5%
- Product Code: 56465
Alias:
Tungsten silicide
CAS:
12039-88-2
| Molecular Weight: | 240.01 g./mol | Molecular Formula: | WSi₂ |
|---|---|---|---|
| EC Number: | 234-909-0 | MDL Number: | MFCD00049704 |
| Melting Point: | 2165°C | Boiling Point: | |
| Density: | 9.88 g/cm3 | Storage Condition: | room temperature |
Product Description:
Tungsten silicide is widely used in the semiconductor industry as a conductive material for integrated circuits, particularly in the fabrication of gate electrodes and interconnects. Its high thermal stability and low electrical resistance make it suitable for high-temperature applications, ensuring reliable performance in microelectronics. Additionally, it serves as a diffusion barrier in metallization processes, preventing unwanted interactions between layers in semiconductor devices. In the field of thin-film technology, tungsten silicide is employed in the production of solar cells and flat-panel displays due to its excellent electrical conductivity and durability. Its resistance to oxidation and corrosion also makes it valuable in protective coatings for various industrial components.
Product Specification:
| Test | Specification |
|---|---|
| PARTICLE SIZE | 300mesh 350mesh |
| PURITYBASED ON TRACE METALS ANALYSIS | 99.5 100% |
| TOTAL METALLIC IMPURITIES | 0ppm 6000ppm |
| APPEARANCE | Grey to dark grey powder |
| ICPCONFIRMS W SI COMPONENTS | Confirmed |
| X-RAY DIFFRACTION | Conforms to Structure |
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 10.000 | 10-20 days | ฿1,350.00 |
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| 50.000 | 10-20 days | ฿3,590.00 |
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| 250.000 | 10-20 days | ฿15,880.00 |
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Tungsten silicide
Tungsten silicide is widely used in the semiconductor industry as a conductive material for integrated circuits, particularly in the fabrication of gate electrodes and interconnects. Its high thermal stability and low electrical resistance make it suitable for high-temperature applications, ensuring reliable performance in microelectronics. Additionally, it serves as a diffusion barrier in metallization processes, preventing unwanted interactions between layers in semiconductor devices. In the field of thin-film technology, tungsten silicide is employed in the production of solar cells and flat-panel displays due to its excellent electrical conductivity and durability. Its resistance to oxidation and corrosion also makes it valuable in protective coatings for various industrial components.
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