Tantalum(V) methoxide
99%(99.99 %-Ta)
- Product Code: 61169
CAS:
865-35-0
| Molecular Weight: | 336.12 g./mol | Molecular Formula: | C₅H₁₅O₅Ta |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD00058817 | |
| Melting Point: | 49-51°C | Boiling Point: | 188-190°C 10mm |
| Density: | Storage Condition: | room temperature |
Product Description:
Used in the production of thin films for electronic and optical devices, it serves as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes. It is also employed in the synthesis of advanced ceramics and coatings, enhancing their thermal and chemical stability. Additionally, it plays a role in catalysis for organic reactions, particularly in polymerization processes. Its application in nanotechnology is significant for creating nanostructured materials with tailored properties.
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 1.000 | 10-20 days | ฿5,094.00 |
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Tantalum(V) methoxide
Used in the production of thin films for electronic and optical devices, it serves as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes. It is also employed in the synthesis of advanced ceramics and coatings, enhancing their thermal and chemical stability. Additionally, it plays a role in catalysis for organic reactions, particularly in polymerization processes. Its application in nanotechnology is significant for creating nanostructured materials with tailored properties.
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