Benzoin dimethyl ether (DMPA)
99%
- Product Code: 62048
Alias:
Photoinitiator 651; Benzoin dimethyl ether (DMPA); Benzoin dimethyl ether, photoinitiator-6512, BDK, 2,2-dimethoxy-2-phenylacetophenone
CAS:
24650-42-8
| Molecular Weight: | 256.3 g./mol | Molecular Formula: | C₁₆H₁₆O₃ |
|---|---|---|---|
| EC Number: | 246-386-6 | MDL Number: | MFCD00008475 |
| Melting Point: | 67-70 °C(lit.) | Boiling Point: | 169°C 7mm |
| Density: | Storage Condition: | room temperature |
Product Description:
Benzoin dimethyl ether (DMPA) is widely used as a photoinitiator in UV-curable coatings, inks, and adhesives. It generates free radicals upon exposure to ultraviolet light, initiating the polymerization process that solidifies these materials. This makes it essential in industries requiring rapid curing, such as printing, packaging, and electronics. Additionally, DMPA is utilized in the production of photoresists for microfabrication in the semiconductor industry, where precise patterning is critical. Its efficiency in initiating cross-linking reactions under UV light ensures high-quality, durable finishes in various applications.
Product Specification:
| Test | Specification |
|---|---|
| HEAVY METALSAS PB | 0-50 |
| LOSS ON DRYING | 0-1 |
| Melting point | 65-69 |
| PurityGC | 98.5-100 |
| APPEARANCE | WHITE POWDER OR CRYSTALS |
| INFRARED SPECTRUM | Conforms to Structure |
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 50.000 | 10-20 days | £16.28 |
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| 250.000 | 10-20 days | £42.52 |
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| 1000.000 | 10-20 days | £111.50 |
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| 5000.000 | 10-20 days | £485.81 |
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Benzoin dimethyl ether (DMPA)
Benzoin dimethyl ether (DMPA) is widely used as a photoinitiator in UV-curable coatings, inks, and adhesives. It generates free radicals upon exposure to ultraviolet light, initiating the polymerization process that solidifies these materials. This makes it essential in industries requiring rapid curing, such as printing, packaging, and electronics. Additionally, DMPA is utilized in the production of photoresists for microfabrication in the semiconductor industry, where precise patterning is critical. Its efficiency in initiating cross-linking reactions under UV light ensures high-quality, durable finishes in various applications.
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