(Perfluorohexyl)phenyliodonium Trifluoromethanesulfonate
≥98%
- Product Code: 62376
CAS:
77758-84-0
Molecular Weight: | 672.12 g./mol | Molecular Formula: | C₁₃H₅F₁₆IO₃S |
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EC Number: | MDL Number: | MFCD00135119 | |
Melting Point: | Boiling Point: | ||
Density: | Storage Condition: | Store at 2-8°C, filled with argon |
Product Description:
This chemical is widely used in the field of organic synthesis, particularly as a highly effective photoacid generator (PAG). It plays a crucial role in photolithography processes, especially in the manufacturing of semiconductors and microelectronics, where it helps in creating precise patterns on silicon wafers. Its ability to generate strong acids upon exposure to light makes it valuable in advanced photoresist formulations. Additionally, it is utilized in surface modification and coating applications, enhancing the properties of materials such as water repellency and chemical resistance. Its unique structure also makes it suitable for research in fluorinated compounds and their specialized applications.
Product Specification:
Test | Specification |
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APPEARANCE | White to Light yellow powder to crystal |
PURITY | 97.5-100 |
MELTING POINT | 120.0-126.0 |
Infrared spectrum | Conforms to Structure |
Sizes / Availability / Pricing:
Size (g) | Availability | Price | Quantity |
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0.250 | 10-20 days | ฿3,573.00 |
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1.000 | 10-20 days | ฿8,514.00 |
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(Perfluorohexyl)phenyliodonium Trifluoromethanesulfonate
This chemical is widely used in the field of organic synthesis, particularly as a highly effective photoacid generator (PAG). It plays a crucial role in photolithography processes, especially in the manufacturing of semiconductors and microelectronics, where it helps in creating precise patterns on silicon wafers. Its ability to generate strong acids upon exposure to light makes it valuable in advanced photoresist formulations. Additionally, it is utilized in surface modification and coating applications, enhancing the properties of materials such as water repellency and chemical resistance. Its unique structure also makes it suitable for research in fluorinated compounds and their specialized applications.
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