(Perfluorohexyl)phenyliodonium Trifluoromethanesulfonate

≥98%

  • Product Code: 62376
  CAS:    77758-84-0
Molecular Weight: 672.12 g./mol Molecular Formula: C₁₃H₅F₁₆IO₃S
EC Number: MDL Number: MFCD00135119
Melting Point: Boiling Point:
Density: Storage Condition: Store at 2-8°C, filled with argon
Product Description: This chemical is widely used in the field of organic synthesis, particularly as a highly effective photoacid generator (PAG). It plays a crucial role in photolithography processes, especially in the manufacturing of semiconductors and microelectronics, where it helps in creating precise patterns on silicon wafers. Its ability to generate strong acids upon exposure to light makes it valuable in advanced photoresist formulations. Additionally, it is utilized in surface modification and coating applications, enhancing the properties of materials such as water repellency and chemical resistance. Its unique structure also makes it suitable for research in fluorinated compounds and their specialized applications.
Product Specification:
Test Specification
APPEARANCE White to Light yellow powder to crystal
PURITY 97.5-100
MELTING POINT 120.0-126.0
Infrared spectrum Conforms to Structure
Sizes / Availability / Pricing:
Size (g) Availability Price Quantity
0.250 10-20 days ฿3,573.00
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-
1.000 10-20 days ฿8,514.00
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-
(Perfluorohexyl)phenyliodonium Trifluoromethanesulfonate
This chemical is widely used in the field of organic synthesis, particularly as a highly effective photoacid generator (PAG). It plays a crucial role in photolithography processes, especially in the manufacturing of semiconductors and microelectronics, where it helps in creating precise patterns on silicon wafers. Its ability to generate strong acids upon exposure to light makes it valuable in advanced photoresist formulations. Additionally, it is utilized in surface modification and coating applications, enhancing the properties of materials such as water repellency and chemical resistance. Its unique structure also makes it suitable for research in fluorinated compounds and their specialized applications.
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