Nickel(II) oxalate hydrate
99.9985% (metals basis)
- Product Code: 67541
CAS:
126956-48-7
Molecular Weight: | 146.73(anhy) g./mol | Molecular Formula: | C₂NiO₄H₂O₂ |
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EC Number: | MDL Number: | MFCD00167155 | |
Melting Point: | Boiling Point: | 365.1°C | |
Density: | Storage Condition: | room temperature |
Product Description:
Nickel(II) oxalate hydrate is primarily used in the synthesis of nickel-based catalysts, which are essential in various industrial chemical reactions, including hydrogenation and reforming processes. It serves as a precursor for producing nickel nanoparticles and other nickel compounds, which are utilized in battery technologies, particularly in the development of nickel-metal hydride batteries. Additionally, it finds application in the preparation of specialty ceramics and glasses, where nickel incorporation can modify electrical and optical properties. In research, it is employed as a reagent for studying coordination chemistry and as a starting material for the deposition of nickel films through chemical vapor deposition techniques.
Product Specification:
Test | Specification |
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PURITYBASED ON TRACE METALS ANALYSIS | 99.9985 100% |
APPEARANCE | GREEN POWDER |
Sizes / Availability / Pricing:
Size (g) | Availability | Price | Quantity |
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1.000 | 10-20 days | ฿2,180.00 |
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5.000 | 10-20 days | ฿7,990.00 |
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Nickel(II) oxalate hydrate
Nickel(II) oxalate hydrate is primarily used in the synthesis of nickel-based catalysts, which are essential in various industrial chemical reactions, including hydrogenation and reforming processes. It serves as a precursor for producing nickel nanoparticles and other nickel compounds, which are utilized in battery technologies, particularly in the development of nickel-metal hydride batteries. Additionally, it finds application in the preparation of specialty ceramics and glasses, where nickel incorporation can modify electrical and optical properties. In research, it is employed as a reagent for studying coordination chemistry and as a starting material for the deposition of nickel films through chemical vapor deposition techniques.
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