1,1,3,3,5,5-Hexaethoxy-1,3,5-trisilacyclohexane
≥90%(GC)
- Product Code: 68067
CAS:
17955-67-8
Molecular Weight: | 396.70 g./mol | Molecular Formula: | C₁₅H₃₆O₆Si₃ |
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EC Number: | MDL Number: | MFCD06660097 | |
Melting Point: | Boiling Point: | 133°C|5mmHg(lit.) | |
Density: | 1.02 | Storage Condition: | room temperature, dry |
Product Description:
Used primarily in the production of advanced materials, this chemical serves as a precursor for silicon-based polymers and ceramics. It is applied in the synthesis of silicon carbide and silicon nitride, which are essential in high-temperature and high-strength applications. Additionally, it finds use in the development of coatings and thin films, providing enhanced durability and resistance to environmental factors. In the electronics industry, it is utilized in the fabrication of semiconductors and insulating layers, contributing to improved performance and reliability of electronic devices.
Product Specification:
Test | Specification |
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APPEARANCE | Colorless - Almost colorless Liquid |
PURITY | 90-100 |
SPECIFIC GRAVITY 2020 | 1.0160-1.0200 |
Refractive index n20D | 1.4360-1.4400 |
Infrared spectrum | Conforms to Structure |
Sizes / Availability / Pricing:
Size (g) | Availability | Price | Quantity |
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0.250 | 10-20 days | ฿1,520.00 |
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1.000 | 10-20 days | ฿4,390.00 |
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5.000 | 10-20 days | ฿20,520.00 |
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1,1,3,3,5,5-Hexaethoxy-1,3,5-trisilacyclohexane
Used primarily in the production of advanced materials, this chemical serves as a precursor for silicon-based polymers and ceramics. It is applied in the synthesis of silicon carbide and silicon nitride, which are essential in high-temperature and high-strength applications. Additionally, it finds use in the development of coatings and thin films, providing enhanced durability and resistance to environmental factors. In the electronics industry, it is utilized in the fabrication of semiconductors and insulating layers, contributing to improved performance and reliability of electronic devices.
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