2-Isopropyl-2-methacryloyloxyadamantane
≥98%(GC)
- Product Code: 68123
CAS:
297156-50-4
| Molecular Weight: | 262.39 g./mol | Molecular Formula: | C₁₇H₂₆O₂ |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD22571643 | |
| Melting Point: | 40°C | Boiling Point: | |
| Density: | Storage Condition: | 2-8°C |
Product Description:
Used primarily in the production of advanced polymer materials, this chemical is a key component in the development of high-performance resins. Its unique structure contributes to the creation of polymers with exceptional thermal stability and mechanical strength, making it ideal for use in coatings, adhesives, and composite materials. Additionally, it is employed in the synthesis of photoresists for semiconductor manufacturing, where its properties enhance the precision and durability of microelectronic components. The chemical's resistance to degradation under harsh conditions also makes it suitable for applications in aerospace and automotive industries, where materials must withstand extreme environments.
Product Specification:
| Test | Specification |
|---|---|
| APPEARANCE | White to Almost white powder to crystal |
| PURITY | 97.5-100 |
| Infrared spectrum | Conforms to Structure |
| NMR | Conforms to Structure |
| NOTE: | This product is low melting point solid,may change state in different environments (solid, liquid or semi-solid) |
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 1.000 | 10-20 days | ฿950.00 |
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| 5.000 | 10-20 days | ฿3,720.00 |
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| 25.000 | 10-20 days | ฿17,580.00 |
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2-Isopropyl-2-methacryloyloxyadamantane
Used primarily in the production of advanced polymer materials, this chemical is a key component in the development of high-performance resins. Its unique structure contributes to the creation of polymers with exceptional thermal stability and mechanical strength, making it ideal for use in coatings, adhesives, and composite materials. Additionally, it is employed in the synthesis of photoresists for semiconductor manufacturing, where its properties enhance the precision and durability of microelectronic components. The chemical's resistance to degradation under harsh conditions also makes it suitable for applications in aerospace and automotive industries, where materials must withstand extreme environments.
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