Triethylfluorosilane
97%
- Product Code: 68175
CAS:
358-43-0
| Molecular Weight: | 134.27 g./mol | Molecular Formula: | C₆H₁₅FSi |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD00053170 | |
| Melting Point: | Boiling Point: | ||
| Density: | 0.835(lit.) | Storage Condition: | room temperature, dry |
Product Description:
Triethylfluorosilane is primarily used in the field of organic synthesis as a reagent for introducing silicon-containing functional groups into molecules. It is particularly valuable in the preparation of silicon-based polymers and resins, which are essential in the production of coatings, adhesives, and sealants. The compound also finds application in the semiconductor industry, where it serves as a precursor for depositing silicon-containing thin films through chemical vapor deposition (CVD) processes. Additionally, it is employed in surface modification treatments to impart hydrophobic properties to materials, enhancing their resistance to moisture and environmental degradation.
Product Specification:
| Test | Specification |
|---|---|
| APPEARANCE | COLORLESS LIQUID |
| PURITY | 96.5-100 |
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 0.250 | 10-20 days | ฿6,290.00 |
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| 1.000 | 10-20 days | ฿15,310.00 |
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Triethylfluorosilane
Triethylfluorosilane is primarily used in the field of organic synthesis as a reagent for introducing silicon-containing functional groups into molecules. It is particularly valuable in the preparation of silicon-based polymers and resins, which are essential in the production of coatings, adhesives, and sealants. The compound also finds application in the semiconductor industry, where it serves as a precursor for depositing silicon-containing thin films through chemical vapor deposition (CVD) processes. Additionally, it is employed in surface modification treatments to impart hydrophobic properties to materials, enhancing their resistance to moisture and environmental degradation.
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