BIS[BIS(TRIMETHYLSILYL)AMINO]TIN II
- Product Code: 68191
CAS:
59863-13-7
| Molecular Weight: | 439.48 g./mol | Molecular Formula: | C₁₂H₃₆N₂Si₄Sn |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD00191794 | |
| Melting Point: | 37-38 °C(lit.) | Boiling Point: | 112 °C0.05 mm Hg(lit.) |
| Density: | 1.136 g/mL at 25 °C(lit.) | Storage Condition: | 2-8°C |
Product Description:
Used as a precursor in the synthesis of tin-containing materials, particularly in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes. It plays a key role in the production of thin films for semiconductors and electronic devices, where precise control over material composition and thickness is critical. Additionally, it is employed in the development of advanced coatings and nanomaterials, contributing to innovations in optics, energy storage, and catalysis. Its reactivity with various substrates makes it valuable in research and industrial applications requiring high-purity tin-based compounds.
Product Specification:
| Test | Specification |
|---|---|
| APPEARANCE | Orange to Very Dark Orange and Red toVery Dark Red and Orange-Red and environments (solid, liquid or semi-solid) |
| Refractive index at 20 C | 1.512-1.516 |
| Infrared spectrum | Conforms to Structure |
| NMR | Conforms to Structure |
| NOTE: | This product is low melting point solid,may change state in different |
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 5.000 | 10-20 days | ฿10,660.00 |
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BIS[BIS(TRIMETHYLSILYL)AMINO]TIN II
Used as a precursor in the synthesis of tin-containing materials, particularly in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes. It plays a key role in the production of thin films for semiconductors and electronic devices, where precise control over material composition and thickness is critical. Additionally, it is employed in the development of advanced coatings and nanomaterials, contributing to innovations in optics, energy storage, and catalysis. Its reactivity with various substrates makes it valuable in research and industrial applications requiring high-purity tin-based compounds.
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