Copper(II) trifluoroacetylacetonate
97%
- Product Code: 71289
CAS:
14324-82-4
| Molecular Weight: | 369.7 g./mol | Molecular Formula: | CuC₆H₄F₃O₂₂ |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD00042511 | |
| Melting Point: | 198 - 199 °C - lit | Boiling Point: | 260 °C (lit.) |
| Density: | 0.721 g/cm3 at 25 °C (lit.) | Storage Condition: | room temperature |
Product Description:
Used as a precursor in the chemical vapor deposition (CVD) process to produce thin films of copper and copper oxide, which are essential in the manufacturing of semiconductors and electronic devices. It is also employed in the synthesis of coordination polymers and metal-organic frameworks (MOFs) due to its ability to form stable complexes with organic ligands. Additionally, it serves as a catalyst in various organic reactions, including polymerization and oxidation processes, enhancing reaction efficiency and selectivity. Its role in the development of advanced materials and nanotechnology applications is significant, contributing to innovations in electronics, catalysis, and material science.
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 5.000 | 10-20 days | $180.91 |
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Copper(II) trifluoroacetylacetonate
Used as a precursor in the chemical vapor deposition (CVD) process to produce thin films of copper and copper oxide, which are essential in the manufacturing of semiconductors and electronic devices. It is also employed in the synthesis of coordination polymers and metal-organic frameworks (MOFs) due to its ability to form stable complexes with organic ligands. Additionally, it serves as a catalyst in various organic reactions, including polymerization and oxidation processes, enhancing reaction efficiency and selectivity. Its role in the development of advanced materials and nanotechnology applications is significant, contributing to innovations in electronics, catalysis, and material science.
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