1,1,2,2-Tetrafluoro-N,N-dimethylethanamine

95%

  • Product Code: 72684
  CAS:    1550-50-1
Molecular Weight: 145.1 g./mol Molecular Formula: C₄H₇F₄N
EC Number: MDL Number:
Melting Point: Boiling Point: 77°C
Density: Storage Condition: 2-8°C
Product Description: Primarily utilized in the field of organic synthesis, this compound serves as a versatile reagent for introducing fluorine atoms into various organic molecules. Its application is crucial in the development of pharmaceuticals, where fluorinated compounds often exhibit enhanced metabolic stability and bioavailability. Additionally, it is employed in the production of agrochemicals, contributing to the creation of more effective and environmentally friendly pesticides. In material science, it is used to modify the properties of polymers, enhancing their resistance to heat, chemicals, and UV radiation. The compound also finds use in the electronics industry, particularly in the manufacturing of specialty gases for plasma etching processes in semiconductor fabrication.
Product Specification:
Test Specification
APPEARANCE Colorless to yellow liquid
PURITY 94.5-100
Infrared spectrum Conforms to Structure
Sizes / Availability / Pricing:
Size (g) Availability Price Quantity
1.000 10-20 days Ft5,171.57
+
-
5.000 10-20 days Ft14,545.05
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-
25.000 10-20 days Ft58,718.89
+
-
1,1,2,2-Tetrafluoro-N,N-dimethylethanamine
Primarily utilized in the field of organic synthesis, this compound serves as a versatile reagent for introducing fluorine atoms into various organic molecules. Its application is crucial in the development of pharmaceuticals, where fluorinated compounds often exhibit enhanced metabolic stability and bioavailability. Additionally, it is employed in the production of agrochemicals, contributing to the creation of more effective and environmentally friendly pesticides. In material science, it is used to modify the properties of polymers, enhancing their resistance to heat, chemicals, and UV radiation. The compound also finds use in the electronics industry, particularly in the manufacturing of specialty gases for plasma etching processes in semiconductor fabrication.
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