(3,5-Dichlorophenyl)(2,4,6-trimethoxyphenyl)iodonium p-Toluenesulfonate

95%

  • Product Code: 73134
  CAS:    1868173-25-4
Molecular Weight: 611.27 g./mol Molecular Formula: C₂₂H₂₁Cl₂IO₆S
EC Number: MDL Number:
Melting Point: 194°C Boiling Point:
Density: Storage Condition: 2-8°C
Product Description: This compound is primarily utilized in the field of photopolymerization, where it serves as a highly efficient photoacid generator (PAG). Upon exposure to ultraviolet (UV) light, it releases strong acids that initiate the polymerization process, making it valuable in the production of advanced coatings, adhesives, and photoresists. Its ability to generate acids under UV light is particularly beneficial in the fabrication of microelectronics, where precise patterning and high-resolution imaging are required. Additionally, it is employed in the development of optical materials and in the synthesis of specialty polymers, where controlled acid generation is essential for achieving desired material properties.
Product Specification:
Test Specification
APPEARANCE White to Light yellow to Light orange powder to crystal
PURITY 94.5-100
Infrared spectrum Conforms to Structure
Sizes / Availability / Pricing:
Size (g) Availability Price Quantity
0.200 10-20 days ฿2,650.00
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1.000 10-20 days ฿7,980.00
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(3,5-Dichlorophenyl)(2,4,6-trimethoxyphenyl)iodonium p-Toluenesulfonate
This compound is primarily utilized in the field of photopolymerization, where it serves as a highly efficient photoacid generator (PAG). Upon exposure to ultraviolet (UV) light, it releases strong acids that initiate the polymerization process, making it valuable in the production of advanced coatings, adhesives, and photoresists. Its ability to generate acids under UV light is particularly beneficial in the fabrication of microelectronics, where precise patterning and high-resolution imaging are required. Additionally, it is employed in the development of optical materials and in the synthesis of specialty polymers, where controlled acid generation is essential for achieving desired material properties.
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