(4-Methoxyphenyl)diphenylsulfonium triflate
- Product Code: 73140
CAS:
116808-67-4
| Molecular Weight: | 442.47 g./mol | Molecular Formula: | C₂₀H₁₇F₃O₄S₂ |
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| EC Number: | MDL Number: | ||
| Melting Point: | 101 - 104 °C - lit. | Boiling Point: | |
| Density: | 1.29 g/cm3 | Storage Condition: | room temperature |
Product Description:
This chemical is primarily used as a photoacid generator (PAG) in photolithography processes, particularly in the semiconductor and electronics industries. When exposed to ultraviolet (UV) light, it generates strong acids that catalyze the chemical reactions needed to create precise patterns on silicon wafers. This makes it essential for manufacturing microchips, integrated circuits, and other microelectronic devices. Its efficiency and stability under UV exposure ensure high-resolution patterning, which is critical for advancing technology in miniaturized electronics. Additionally, it is sometimes employed in advanced materials research for developing photosensitive polymers and coatings.
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 0.250 | 10-20 days | ฿4,230.00 |
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| 1.000 | 10-20 days | ฿12,510.00 |
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(4-Methoxyphenyl)diphenylsulfonium triflate
This chemical is primarily used as a photoacid generator (PAG) in photolithography processes, particularly in the semiconductor and electronics industries. When exposed to ultraviolet (UV) light, it generates strong acids that catalyze the chemical reactions needed to create precise patterns on silicon wafers. This makes it essential for manufacturing microchips, integrated circuits, and other microelectronic devices. Its efficiency and stability under UV exposure ensure high-resolution patterning, which is critical for advancing technology in miniaturized electronics. Additionally, it is sometimes employed in advanced materials research for developing photosensitive polymers and coatings.
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