(4-Phenoxyphenyl)diphenylsulfonium triflate
- Product Code: 73142
CAS:
240482-96-6
| Molecular Weight: | 504.54 g./mol | Molecular Formula: | C₂₅H₁₉F₃O₄S₂ |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD02683566 | |
| Melting Point: | 90 - 94 °C - lit. | Boiling Point: | |
| Density: | Storage Condition: | room temperature |
Product Description:
Widely used as a photoacid generator in photolithography processes within the semiconductor industry. It plays a critical role in the production of microchips and other electronic components by generating acid upon exposure to UV light, which helps in patterning and etching silicon wafers. Additionally, it is employed in advanced materials science for creating high-resolution images in photoresist coatings, enabling precise fabrication of nanoscale structures. Its efficiency in generating strong acids under light exposure makes it valuable in various high-tech manufacturing applications.
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 0.050 | 10-20 days | ฿1,584.00 |
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| 0.250 | 10-20 days | ฿4,023.00 |
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(4-Phenoxyphenyl)diphenylsulfonium triflate
Widely used as a photoacid generator in photolithography processes within the semiconductor industry. It plays a critical role in the production of microchips and other electronic components by generating acid upon exposure to UV light, which helps in patterning and etching silicon wafers. Additionally, it is employed in advanced materials science for creating high-resolution images in photoresist coatings, enabling precise fabrication of nanoscale structures. Its efficiency in generating strong acids under light exposure makes it valuable in various high-tech manufacturing applications.
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