Bis(4-tert-butylphenyl)iodoniump-toluenesulfonate

≥99% trace metals basis

  • Product Code: 73494
  CAS:    131717-99-2
Molecular Weight: 564.52 g./mol Molecular Formula: C₂₇H₃₃IO₃S
EC Number: MDL Number: MFCD02683472
Melting Point: 237 - 240 °C Boiling Point:
Density: Storage Condition: room temperature
Product Description: This chemical is primarily used as a photoacid generator (PAG) in photoresist formulations for the semiconductor and electronics industries. When exposed to ultraviolet (UV) light, it releases strong acids that catalyze the chemical reactions necessary for patterning microelectronic devices. Its high efficiency and stability make it suitable for advanced lithography processes, including deep UV (DUV) and extreme UV (EUV) lithography, which are critical for manufacturing high-performance integrated circuits. Additionally, it is employed in the production of flat-panel displays and other micro-scale components, where precise and high-resolution patterning is essential. Its compatibility with various resist systems and ability to generate clean patterns contribute to its widespread use in cutting-edge technology fabrication.
Sizes / Availability / Pricing:
Size (g) Availability Price Quantity
0.050 10-20 days ฿2,250.00
+
-
0.250 10-20 days ฿7,209.00
+
-
Bis(4-tert-butylphenyl)iodoniump-toluenesulfonate
This chemical is primarily used as a photoacid generator (PAG) in photoresist formulations for the semiconductor and electronics industries. When exposed to ultraviolet (UV) light, it releases strong acids that catalyze the chemical reactions necessary for patterning microelectronic devices. Its high efficiency and stability make it suitable for advanced lithography processes, including deep UV (DUV) and extreme UV (EUV) lithography, which are critical for manufacturing high-performance integrated circuits. Additionally, it is employed in the production of flat-panel displays and other micro-scale components, where precise and high-resolution patterning is essential. Its compatibility with various resist systems and ability to generate clean patterns contribute to its widespread use in cutting-edge technology fabrication.
Mechanism -
Appearance -
Longevity -
Strength -
Storage -
Shelf Life -
Allergen(s) -
Dosage (Range) -
Dosage (Per Day) -
Mix Method -
Heat Resistance -
Stable in pH range -
Solubility -
Product Types -
INCI -

Cart

No products

Subtotal: ฿0.00
฿0.00 Total :