Triphenylsulfonium perfluoro-1-butanesufonate
≥99%
- Product Code: 73530
Alias:
Pentafluoro-1-butanesulfonic acid triphenylsulfonate
CAS:
144317-44-2
| Molecular Weight: | 562.47 g./mol | Molecular Formula: | C₂₂H₁₅F₉O₃S₂ |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD02683476 | |
| Melting Point: | 84 - 88 °C - lit. | Boiling Point: | |
| Density: | Storage Condition: | room temperature |
Product Description:
Used primarily as a photoacid generator in photolithography processes, particularly in the semiconductor industry. It plays a critical role in the production of microelectronic devices, enabling the creation of precise patterns on silicon wafers. The compound generates acid upon exposure to ultraviolet light, which helps in the development of high-resolution images on photoresist materials. Additionally, it is valued for its thermal stability and solubility in organic solvents, making it suitable for advanced lithographic techniques. Its application extends to the fabrication of integrated circuits and other nanoscale components, contributing to the miniaturization and efficiency of electronic devices.
Product Specification:
| Test | Specification |
|---|---|
| APPEARANCE | White to Off-White Powder or Crystals |
| PURITY | 98.5-100 |
| Trace Metal Analysis | 10000.0 ppm |
| Infrared spectrum | Conforms to Structure |
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 0.050 | 10-20 days | ฿2,690.00 |
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| 0.250 | 10-20 days | ฿7,800.00 |
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| 1.000 | 10-20 days | ฿21,800.00 |
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Triphenylsulfonium perfluoro-1-butanesufonate
Used primarily as a photoacid generator in photolithography processes, particularly in the semiconductor industry. It plays a critical role in the production of microelectronic devices, enabling the creation of precise patterns on silicon wafers. The compound generates acid upon exposure to ultraviolet light, which helps in the development of high-resolution images on photoresist materials. Additionally, it is valued for its thermal stability and solubility in organic solvents, making it suitable for advanced lithographic techniques. Its application extends to the fabrication of integrated circuits and other nanoscale components, contributing to the miniaturization and efficiency of electronic devices.
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