2,3-dimethyl-4'-[8-(1,4-dioxa-8-azaspiro[4.5]decyl)methyl]benzophenone
97%
- Product Code: 75074
CAS:
898757-88-5
Molecular Weight: | 365.48 g./mol | Molecular Formula: | C₂₃H₂₇NO₃ |
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EC Number: | MDL Number: | MFCD03841687 | |
Melting Point: | Boiling Point: | 503℃ at 760 mmHg | |
Density: | 1.19g/ml | Storage Condition: | Room temperature, sealed, ventilated |
Product Description:
Used primarily in the synthesis of advanced organic compounds, this chemical serves as a key intermediate in the development of pharmaceuticals, particularly in the creation of drugs targeting neurological disorders. Its structure is beneficial for binding to specific receptors in the brain, making it valuable in research for treatments related to depression, anxiety, and cognitive impairments. Additionally, it finds application in material science, where it is utilized in the production of specialized polymers and coatings that require precise molecular architecture for enhanced performance and durability. Its unique spirocyclic component also makes it a candidate for use in the development of novel photoresist materials in the electronics industry.
Sizes / Availability / Pricing:
Size (g) | Availability | Price | Quantity |
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1.000 | 10-20 days | Ft626,083.42 |
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2.000 | 10-20 days | Ft1,040,132.39 |
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2,3-dimethyl-4'-[8-(1,4-dioxa-8-azaspiro[4.5]decyl)methyl]benzophenone
Used primarily in the synthesis of advanced organic compounds, this chemical serves as a key intermediate in the development of pharmaceuticals, particularly in the creation of drugs targeting neurological disorders. Its structure is beneficial for binding to specific receptors in the brain, making it valuable in research for treatments related to depression, anxiety, and cognitive impairments. Additionally, it finds application in material science, where it is utilized in the production of specialized polymers and coatings that require precise molecular architecture for enhanced performance and durability. Its unique spirocyclic component also makes it a candidate for use in the development of novel photoresist materials in the electronics industry.
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