3-[8-(1,4-dioxa-8-azaspiro[4.5]decyl)methyl]-4'-methoxy benzophenone
97%
- Product Code: 75455
CAS:
898761-44-9
| Molecular Weight: | 367.45 g./mol | Molecular Formula: | C₂₂H₂₅NO₄ |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD03842183 | |
| Melting Point: | Boiling Point: | 526.4℃ at 760 mmHg | |
| Density: | 1.23g/ml | Storage Condition: | Room temperature, sealed, ventilated |
Product Description:
This chemical is primarily utilized in the field of organic synthesis, particularly in the development of photolabile protecting groups. Its structure, featuring a benzophenone moiety, makes it highly effective in photochemical applications. It is often employed in the protection of functional groups during complex synthetic processes, where it can be selectively removed upon exposure to ultraviolet light. This property is especially valuable in the synthesis of sensitive organic compounds, such as peptides and nucleotides, where precise control over reaction conditions is crucial. Additionally, it finds use in material science for the development of light-responsive materials and coatings. Its ability to undergo photochemical reactions also makes it a candidate for applications in photolithography and the fabrication of microelectronic devices.
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 1.000 | 10-20 days | ฿58,110.00 |
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| 2.000 | 10-20 days | ฿96,540.00 |
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3-[8-(1,4-dioxa-8-azaspiro[4.5]decyl)methyl]-4'-methoxy benzophenone
This chemical is primarily utilized in the field of organic synthesis, particularly in the development of photolabile protecting groups. Its structure, featuring a benzophenone moiety, makes it highly effective in photochemical applications. It is often employed in the protection of functional groups during complex synthetic processes, where it can be selectively removed upon exposure to ultraviolet light. This property is especially valuable in the synthesis of sensitive organic compounds, such as peptides and nucleotides, where precise control over reaction conditions is crucial. Additionally, it finds use in material science for the development of light-responsive materials and coatings. Its ability to undergo photochemical reactions also makes it a candidate for applications in photolithography and the fabrication of microelectronic devices.
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