(2-Methylphenyl)(2,4,6-trimethylphenyl)iodonium Trifluoromethanesulfonate
≥98%
- Product Code: 78328
CAS:
210823-54-4
| Molecular Weight: | 486.29 g./mol | Molecular Formula: | C₁₇H₁₈F₃IO₃S |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD20264884 | |
| Melting Point: | 166-170°C | Boiling Point: | |
| Density: | Storage Condition: | room temperature |
Product Description:
This chemical is widely used in photolithography processes, particularly in the semiconductor industry, where it serves as a photoacid generator (PAG). When exposed to ultraviolet (UV) light, it releases strong acids that catalyze the cross-linking or decomposition of photoresists, enabling precise patterning on silicon wafers. Its high thermal stability and efficient acid generation make it suitable for advanced lithography techniques, including deep UV (DUV) and extreme UV (EUV) lithography. Additionally, it is employed in the synthesis of specialty chemicals and polymers, where its ability to initiate cationic polymerization is leveraged to produce high-performance materials. Its applications also extend to advanced coatings and adhesives, where it enhances curing efficiency and material properties.
Product Specification:
| Test | Specification |
|---|---|
| APPEARANCE | White - Pale reddish yellow Crystal - Powder |
| PURITY | 98-100 |
| Infrared spectrum | Conforms to Structure |
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 0.200 | 10-20 days | ฿1,100.00 |
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| 1.000 | 10-20 days | ฿4,010.00 |
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(2-Methylphenyl)(2,4,6-trimethylphenyl)iodonium Trifluoromethanesulfonate
This chemical is widely used in photolithography processes, particularly in the semiconductor industry, where it serves as a photoacid generator (PAG). When exposed to ultraviolet (UV) light, it releases strong acids that catalyze the cross-linking or decomposition of photoresists, enabling precise patterning on silicon wafers. Its high thermal stability and efficient acid generation make it suitable for advanced lithography techniques, including deep UV (DUV) and extreme UV (EUV) lithography. Additionally, it is employed in the synthesis of specialty chemicals and polymers, where its ability to initiate cationic polymerization is leveraged to produce high-performance materials. Its applications also extend to advanced coatings and adhesives, where it enhances curing efficiency and material properties.
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