(3-Bromophenyl)(mesityl)iodonium Trifluoromethanesulfonate
≥98%
- Product Code: 78330
CAS:
1203709-76-5
| Molecular Weight: | 551.16 g./mol | Molecular Formula: | C₁₆H₁₅BrF₃IO₃S |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD20264881 | |
| Melting Point: | Boiling Point: | ||
| Density: | Storage Condition: | room temperature, dry |
Product Description:
This chemical is primarily utilized in organic synthesis as a highly efficient photoinitiator. It is particularly valuable in photopolymerization processes, where it facilitates the rapid curing of coatings, adhesives, and inks under UV light exposure. Its ability to generate reactive species upon irradiation makes it a key component in the production of high-performance materials with precise control over polymerization kinetics. Additionally, it is employed in the development of advanced photoresists for microelectronics and semiconductor manufacturing, enabling the creation of intricate patterns with high resolution. Its stability and reactivity under light make it a preferred choice in industries requiring durable and finely detailed polymeric products.
Product Specification:
| Test | Specification |
|---|---|
| APPEARANCE | White - Slightly pale yellow Crystal - Powder |
| PURITY | 97.5-100 |
| Infrared spectrum | Conforms to Structure |
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 0.200 | 10-20 days | ฿5,200.00 |
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| 1.000 | 10-20 days | ฿14,200.00 |
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(3-Bromophenyl)(mesityl)iodonium Trifluoromethanesulfonate
This chemical is primarily utilized in organic synthesis as a highly efficient photoinitiator. It is particularly valuable in photopolymerization processes, where it facilitates the rapid curing of coatings, adhesives, and inks under UV light exposure. Its ability to generate reactive species upon irradiation makes it a key component in the production of high-performance materials with precise control over polymerization kinetics. Additionally, it is employed in the development of advanced photoresists for microelectronics and semiconductor manufacturing, enabling the creation of intricate patterns with high resolution. Its stability and reactivity under light make it a preferred choice in industries requiring durable and finely detailed polymeric products.
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