(4-Methylphenyl)(2,4,6-trimethylphenyl)iodonium Trifluoromethanesulfonate
≥98%
- Product Code: 78332
CAS:
1204518-02-4
| Molecular Weight: | 486.29 g./mol | Molecular Formula: | C₁₇H₁₈F₃IO₃S |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD20264882 | |
| Melting Point: | 177-182°C | Boiling Point: | |
| Density: | Storage Condition: | room temperature |
Product Description:
This chemical is primarily used as a photoacid generator (PAG) in photolithography processes within the semiconductor and electronics industries. It plays a critical role in the production of microchips and other electronic components by generating acid upon exposure to ultraviolet (UV) light, which helps in patterning and etching processes. Additionally, it finds applications in advanced materials science for the development of high-resolution imaging systems and photoresists. Its stability and efficiency in generating acid make it suitable for precision manufacturing in nanotechnology and microfabrication.
Product Specification:
| Test | Specification |
|---|---|
| APPEARANCE | White to Light yellow to Dark green powder to crystal |
| PURITY | 98-100 |
| Infrared spectrum | Conforms to Structure |
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 0.200 | 10-20 days | $50.72 |
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| 1.000 | 10-20 days | $139.48 |
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| 5.000 | 10-20 days | $488.61 |
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(4-Methylphenyl)(2,4,6-trimethylphenyl)iodonium Trifluoromethanesulfonate
This chemical is primarily used as a photoacid generator (PAG) in photolithography processes within the semiconductor and electronics industries. It plays a critical role in the production of microchips and other electronic components by generating acid upon exposure to ultraviolet (UV) light, which helps in patterning and etching processes. Additionally, it finds applications in advanced materials science for the development of high-resolution imaging systems and photoresists. Its stability and efficiency in generating acid make it suitable for precision manufacturing in nanotechnology and microfabrication.
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