(4-Nitrophenyl)(phenyl)iodonium Trifluoromethanesulfonate
≥98%
- Product Code: 78334
CAS:
905718-45-8
| Molecular Weight: | 475.18 g./mol | Molecular Formula: | C₁₃H₉F₃INO₅S |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD21608480 | |
| Melting Point: | 198-202°C | Boiling Point: | |
| Density: | Storage Condition: | room temperature |
Product Description:
This chemical is widely used as a photoacid generator (PAG) in photolithography processes, particularly in the semiconductor and electronics industries. It plays a critical role in the production of microchips and other microelectronic devices by generating acid upon exposure to light, which helps in patterning and etching processes. Additionally, it is employed in the synthesis of advanced materials, including polymers and coatings, where precise control of acid release is required. Its ability to initiate cationic polymerization makes it valuable in creating high-performance resins and adhesives. The compound is also utilized in research and development for exploring new photochemical reactions and mechanisms.
Product Specification:
| Test | Specification |
|---|---|
| APPEARANCE | White - Slightly pale reddish yellow Crystal - Powder |
| PURITY | 97.5-100 |
| Infrared spectrum | Conforms to Structure |
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 0.200 | 10-20 days | ฿2,560.00 |
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| 1.000 | 10-20 days | ฿7,610.00 |
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(4-Nitrophenyl)(phenyl)iodonium Trifluoromethanesulfonate
This chemical is widely used as a photoacid generator (PAG) in photolithography processes, particularly in the semiconductor and electronics industries. It plays a critical role in the production of microchips and other microelectronic devices by generating acid upon exposure to light, which helps in patterning and etching processes. Additionally, it is employed in the synthesis of advanced materials, including polymers and coatings, where precise control of acid release is required. Its ability to initiate cationic polymerization makes it valuable in creating high-performance resins and adhesives. The compound is also utilized in research and development for exploring new photochemical reactions and mechanisms.
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