[(4-Trifluoromethyl)phenyl](2,4,6-trimethoxyphenyl)iodonium p-Toluenesulfonate
≥97%
- Product Code: 78354
CAS:
1868173-15-2
| Molecular Weight: | 610.38 g./mol | Molecular Formula: | C₂₃H₂₂F₃IO₆S |
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| Density: | Storage Condition: | 2-8°C |
Product Description:
This compound is primarily used as a photoacid generator (PAG) in photolithography processes within the semiconductor and electronics industries. Upon exposure to ultraviolet (UV) light, it releases strong acids, which are essential for catalyzing chemical reactions in photoresist materials. This enables the precise patterning of microelectronic components on silicon wafers, critical for manufacturing integrated circuits and microchips. Its high efficiency and stability under UV light make it a valuable component in advanced lithography techniques, contributing to the miniaturization and enhanced performance of electronic devices. Additionally, it finds applications in the development of high-resolution imaging materials and advanced coatings.
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 0.200 | 10-20 days | ฿2,180.00 |
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[(4-Trifluoromethyl)phenyl](2,4,6-trimethoxyphenyl)iodonium p-Toluenesulfonate
This compound is primarily used as a photoacid generator (PAG) in photolithography processes within the semiconductor and electronics industries. Upon exposure to ultraviolet (UV) light, it releases strong acids, which are essential for catalyzing chemical reactions in photoresist materials. This enables the precise patterning of microelectronic components on silicon wafers, critical for manufacturing integrated circuits and microchips. Its high efficiency and stability under UV light make it a valuable component in advanced lithography techniques, contributing to the miniaturization and enhanced performance of electronic devices. Additionally, it finds applications in the development of high-resolution imaging materials and advanced coatings.
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