[4-(Trifluoromethyl)phenyl](2,4,6-trimethylphenyl)iodonium Trifluoromethanesulfonate
≥98%
- Product Code: 78356
CAS:
1232133-62-8
| Molecular Weight: | 540.26 g./mol | Molecular Formula: | C₁₇H₁₅F₆IO₃S |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD27978254 | |
| Melting Point: | 201-205°C | Boiling Point: | |
| Density: | Storage Condition: | room temperature |
Product Description:
This chemical is primarily used as a photoacid generator (PAG) in photolithography processes within the semiconductor industry. It plays a critical role in the production of microelectronic devices by generating acid upon exposure to ultraviolet (UV) light, which then initiates the chemical reactions necessary for patterning semiconductor materials. Its high efficiency and stability under UV exposure make it suitable for advanced lithography techniques, including deep UV (DUV) and extreme UV (EUV) lithography. Additionally, it is employed in the synthesis of specialty polymers and coatings, where controlled acid generation is required for cross-linking or curing processes. Its trifluoromethyl groups enhance its solubility in organic solvents, making it versatile for various industrial applications.
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 0.200 | 10-20 days | ฿2,907.00 |
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| 1.000 | 10-20 days | ฿8,766.00 |
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[4-(Trifluoromethyl)phenyl](2,4,6-trimethylphenyl)iodonium Trifluoromethanesulfonate
This chemical is primarily used as a photoacid generator (PAG) in photolithography processes within the semiconductor industry. It plays a critical role in the production of microelectronic devices by generating acid upon exposure to ultraviolet (UV) light, which then initiates the chemical reactions necessary for patterning semiconductor materials. Its high efficiency and stability under UV exposure make it suitable for advanced lithography techniques, including deep UV (DUV) and extreme UV (EUV) lithography. Additionally, it is employed in the synthesis of specialty polymers and coatings, where controlled acid generation is required for cross-linking or curing processes. Its trifluoromethyl groups enhance its solubility in organic solvents, making it versatile for various industrial applications.
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