Bis(2,4,6-trimethylphenyl)iodonium Trifluoromethanesulfonate
≥98%
- Product Code: 78363
CAS:
139139-80-3
| Molecular Weight: | 514.34 g./mol | Molecular Formula: | C₁₉H₂₂F₃IO₃S |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD25541454 | |
| Melting Point: | Boiling Point: | ||
| Density: | Storage Condition: | room temperature, dry |
Product Description:
Widely used as a photoacid generator (PAG) in photoresist formulations for semiconductor manufacturing. It plays a critical role in photolithography processes, where it generates strong acids upon exposure to UV light, facilitating the patterning of silicon wafers. Its thermal stability and efficiency make it suitable for advanced lithography techniques, including deep UV and extreme UV (EUV) lithography. Additionally, it is employed in the synthesis of specialty chemicals and polymers, where it acts as a catalyst or initiator in cationic polymerization reactions. Its high reactivity and compatibility with various substrates make it valuable in creating high-performance materials for electronics and coatings.
Product Specification:
| Test | Specification |
|---|---|
| APPEARANCE | White to Almost white powder to crystal |
| PURITY | 97.5-100 |
| MELTING POINT | 194-198 |
| Infrared spectrum | Conforms to Structure |
| NMR | Conforms to Structure |
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 0.200 | 10-20 days | ฿1,080.00 |
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| 1.000 | 10-20 days | ฿2,980.00 |
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| 5.000 | 10-20 days | ฿8,080.00 |
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Bis(2,4,6-trimethylphenyl)iodonium Trifluoromethanesulfonate
Widely used as a photoacid generator (PAG) in photoresist formulations for semiconductor manufacturing. It plays a critical role in photolithography processes, where it generates strong acids upon exposure to UV light, facilitating the patterning of silicon wafers. Its thermal stability and efficiency make it suitable for advanced lithography techniques, including deep UV and extreme UV (EUV) lithography. Additionally, it is employed in the synthesis of specialty chemicals and polymers, where it acts as a catalyst or initiator in cationic polymerization reactions. Its high reactivity and compatibility with various substrates make it valuable in creating high-performance materials for electronics and coatings.
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