Bis(4-fluorophenyl)iodonium Trifluoromethanesulfonate
≥97%
- Product Code: 78364
CAS:
732306-64-8
| Molecular Weight: | 466.16 g./mol | Molecular Formula: | C₁₃H₈F₅IO₃S |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD21608479 | |
| Melting Point: | Boiling Point: | ||
| Density: | Storage Condition: | room temperature, dry |
Product Description:
This chemical is primarily used as a photoacid generator (PAG) in photolithography processes, particularly in the manufacturing of semiconductors and microelectronics. Upon exposure to ultraviolet (UV) light, it releases strong acids that catalyze the chemical reactions needed to pattern photoresist materials. This enables the precise etching and deposition of layers on silicon wafers, crucial for creating integrated circuits and other electronic components. Its stability and efficiency in generating acids make it a valuable component in advanced photoresist formulations, contributing to the production of high-resolution and miniaturized devices. Additionally, it finds applications in advanced material synthesis and polymer chemistry, where controlled acid generation is required for specific reactions.
Product Specification:
| Test | Specification |
|---|---|
| APPEARANCE | White to Almost white powder to crystal |
| PURITY | 96.5-100 |
| MELTING POINT | 168-172 |
| Infrared spectrum | Conforms to Structure |
| NMR | Conforms to Structure |
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 0.200 | 10-20 days | ฿2,480.00 |
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| 1.000 | 10-20 days | ฿6,560.00 |
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Bis(4-fluorophenyl)iodonium Trifluoromethanesulfonate
This chemical is primarily used as a photoacid generator (PAG) in photolithography processes, particularly in the manufacturing of semiconductors and microelectronics. Upon exposure to ultraviolet (UV) light, it releases strong acids that catalyze the chemical reactions needed to pattern photoresist materials. This enables the precise etching and deposition of layers on silicon wafers, crucial for creating integrated circuits and other electronic components. Its stability and efficiency in generating acids make it a valuable component in advanced photoresist formulations, contributing to the production of high-resolution and miniaturized devices. Additionally, it finds applications in advanced material synthesis and polymer chemistry, where controlled acid generation is required for specific reactions.
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