Perfluoroheptanesulfonic acid
98%
- Product Code: 79673
CAS:
375-92-8
| Molecular Weight: | 450.12 g./mol | Molecular Formula: | C₇HF₁₆O₃S |
|---|---|---|---|
| EC Number: | MDL Number: | ||
| Melting Point: | Boiling Point: | ||
| Density: | Storage Condition: | room temperature |
Product Description:
Perfluoroheptanesulfonic acid is primarily used in industrial applications due to its strong surfactant properties. It is commonly employed in the production of firefighting foams, particularly for extinguishing fuel-based fires, as it effectively reduces surface tension and forms a film to suppress flames. Additionally, it is utilized in the manufacturing of coatings and adhesives, where its water and oil repellent characteristics enhance product performance. In the electronics industry, it serves as a key component in etching and cleaning processes for semiconductors, ensuring precision and efficiency. Its chemical stability also makes it suitable for use in advanced material synthesis and research applications.
Product Specification:
| Test | Specification |
|---|---|
| APPEARANCE | Light Brown to Brown Solid |
| PURITY | 97.5-100 |
| Infrared spectrum | Conforms to Structure |
| NMR | Conforms to Structure |
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 0.005 | 10-20 days | ฿24,570.00 |
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| 0.025 | 10-20 days | ฿85,990.00 |
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Perfluoroheptanesulfonic acid
Perfluoroheptanesulfonic acid is primarily used in industrial applications due to its strong surfactant properties. It is commonly employed in the production of firefighting foams, particularly for extinguishing fuel-based fires, as it effectively reduces surface tension and forms a film to suppress flames. Additionally, it is utilized in the manufacturing of coatings and adhesives, where its water and oil repellent characteristics enhance product performance. In the electronics industry, it serves as a key component in etching and cleaning processes for semiconductors, ensuring precision and efficiency. Its chemical stability also makes it suitable for use in advanced material synthesis and research applications.
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