4-((4-(Allyloxy)phenyl)sulfonyl)phenol
96%
- Product Code: 81834
CAS:
97042-18-7
| Molecular Weight: | 290.33 g./mol | Molecular Formula: | C₁₅H₁₄O₄S |
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| EC Number: | MDL Number: | ||
| Melting Point: | Boiling Point: | ||
| Density: | Storage Condition: | 2-8°C |
Product Description:
This chemical is primarily utilized in the synthesis of advanced polymeric materials, where it acts as a key monomer or intermediate. Its unique structure, featuring both allyl and sulfonyl groups, makes it suitable for creating high-performance polymers with enhanced thermal stability and mechanical properties. These polymers are often employed in the production of specialty coatings, adhesives, and composites used in industries such as aerospace, automotive, and electronics.
Additionally, it serves as a precursor in the development of photoactive compounds, which are essential in the formulation of photoresists for microfabrication processes in semiconductor manufacturing. Its ability to undergo photochemical reactions under UV light makes it valuable in creating precise patterns on silicon wafers.
In the field of organic synthesis, it is used as a building block for constructing complex molecules with potential pharmaceutical applications. Its reactive sites allow for further functionalization, enabling the creation of novel drug candidates or bioactive compounds.
Overall, this chemical plays a significant role in materials science and advanced manufacturing, contributing to innovations in various high-tech industries.
Product Specification:
| Test | Specification |
|---|---|
| APPEARANCE | solid |
| PURITY | 95.5-100 |
| Infrared spectrum | Conforms to Structure |
| NMR | Conforms to Structure |
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 0.250 | 10-20 days | Ft27,581.72 |
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| 1.000 | 10-20 days | Ft63,782.72 |
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4-((4-(Allyloxy)phenyl)sulfonyl)phenol
This chemical is primarily utilized in the synthesis of advanced polymeric materials, where it acts as a key monomer or intermediate. Its unique structure, featuring both allyl and sulfonyl groups, makes it suitable for creating high-performance polymers with enhanced thermal stability and mechanical properties. These polymers are often employed in the production of specialty coatings, adhesives, and composites used in industries such as aerospace, automotive, and electronics.
Additionally, it serves as a precursor in the development of photoactive compounds, which are essential in the formulation of photoresists for microfabrication processes in semiconductor manufacturing. Its ability to undergo photochemical reactions under UV light makes it valuable in creating precise patterns on silicon wafers.
In the field of organic synthesis, it is used as a building block for constructing complex molecules with potential pharmaceutical applications. Its reactive sites allow for further functionalization, enabling the creation of novel drug candidates or bioactive compounds.
Overall, this chemical plays a significant role in materials science and advanced manufacturing, contributing to innovations in various high-tech industries.
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