1,1,3,3,5,5,7,7-Octamethyl Cyclotetrasilazane
T-95%
- Product Code: 88064
CAS:
1020-84-4
| Molecular Weight: | 292.68 g./mol | Molecular Formula: | C₈H₂₈N₄Si₄ |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD00046123 | |
| Melting Point: | 94-99°C (Lit.) | Boiling Point: | 225°C |
| Density: | Storage Condition: | 2~8℃,Seal |
Product Description:
This chemical is primarily utilized in the production of advanced materials, particularly in the field of semiconductors and electronics. It serves as a precursor for depositing silicon nitride thin films, which are essential for insulating layers in microelectronic devices. Its application extends to the fabrication of coatings that enhance the durability and performance of optical components. Additionally, it is employed in the synthesis of silicon-based polymers, contributing to the development of heat-resistant and chemically stable materials. Its role in these high-tech industries underscores its importance in modern manufacturing and material science.
Product Specification:
| Test | Specification |
|---|---|
| Purity (TECH) | 94.5-100 |
| Purity (GC) | 90-100% |
| Appearance | White powder or crystals |
Sizes / Availability / Pricing:
| Size | Availability | Price | Quantity |
|---|---|---|---|
| 1ml | 10-20 days | $40.45 |
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| 5ml | 10-20 days | $137.70 |
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| 25ml | 10-20 days | $529.72 |
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| 100ml | 10-20 days | $1,919.23 |
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1,1,3,3,5,5,7,7-Octamethyl Cyclotetrasilazane
This chemical is primarily utilized in the production of advanced materials, particularly in the field of semiconductors and electronics. It serves as a precursor for depositing silicon nitride thin films, which are essential for insulating layers in microelectronic devices. Its application extends to the fabrication of coatings that enhance the durability and performance of optical components. Additionally, it is employed in the synthesis of silicon-based polymers, contributing to the development of heat-resistant and chemically stable materials. Its role in these high-tech industries underscores its importance in modern manufacturing and material science.
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