1,1,3,3-Tetrachloro-1,3-Disilabutane
90%
- Product Code: 88068
CAS:
148859-49-8
| Molecular Weight: | 228.053 g./mol | Molecular Formula: | C₂H₆Cl₄Si₂ |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD01862825 | |
| Melting Point: | Boiling Point: | ||
| Density: | Storage Condition: | 2~8℃,Seal |
Product Description:
This chemical is primarily used in the semiconductor and electronics industries as a precursor for silicon carbide (SiC) and silicon nitride (Si3N4) thin films. These films are essential in the production of advanced electronic devices, including power semiconductors and optoelectronic components. Additionally, it serves as a key material in chemical vapor deposition (CVD) processes, enabling the creation of high-performance coatings and protective layers. Its role in nanotechnology and material science is significant, particularly in developing durable and heat-resistant materials for industrial applications.
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 1.000 | 10-20 days | ฿1,980.00 |
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1,1,3,3-Tetrachloro-1,3-Disilabutane
This chemical is primarily used in the semiconductor and electronics industries as a precursor for silicon carbide (SiC) and silicon nitride (Si3N4) thin films. These films are essential in the production of advanced electronic devices, including power semiconductors and optoelectronic components. Additionally, it serves as a key material in chemical vapor deposition (CVD) processes, enabling the creation of high-performance coatings and protective layers. Its role in nanotechnology and material science is significant, particularly in developing durable and heat-resistant materials for industrial applications.
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