1,1-Dichlorosilacyclobutane
98%
- Product Code: 88074
Alias:
1.1-Dichlorosilylcyclobutane; 1,1-Dichlorosilacyclobutane;
CAS:
2351-33-9
| Molecular Weight: | 141.07 g./mol | Molecular Formula: | C₃H₆Cl₂Si |
|---|---|---|---|
| EC Number: | 219-084-7 | MDL Number: | MFCD00053537 |
| Melting Point: | 0ºC | Boiling Point: | 113-115ºC |
| Density: | 1.19g/cm3 | Storage Condition: | 2~8℃ |
Product Description:
1,1-Dichlorosilacyclobutane is primarily used in the field of organic and inorganic synthesis, particularly in the production of silicon-based polymers and materials. Its unique structure allows it to act as a precursor for the creation of silacyclobutane derivatives, which are valuable in the development of advanced materials with specific thermal and mechanical properties. Additionally, it finds application in the semiconductor industry, where it is utilized in chemical vapor deposition (CVD) processes to deposit thin films of silicon-containing compounds. These films are essential for manufacturing electronic devices, such as integrated circuits and solar cells. The compound’s reactivity also makes it suitable for use in surface modification and coating technologies, enhancing the performance and durability of various substrates.
Product Specification:
| Test | Specification |
|---|---|
| Purity | 97.5 100% |
| Appearance | Colorless to Pale Yellow to Pink Liquid |
| REFRACTURE INDEX N20D | 1.462-1.466 |
| Infrared spectrum | Conforms to Structure |
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 1.000 | 10-20 days | ฿1,500.00 |
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| 5.000 | 10-20 days | ฿5,550.00 |
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| 25.000 | 10-20 days | ฿23,200.00 |
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1,1-Dichlorosilacyclobutane
1,1-Dichlorosilacyclobutane is primarily used in the field of organic and inorganic synthesis, particularly in the production of silicon-based polymers and materials. Its unique structure allows it to act as a precursor for the creation of silacyclobutane derivatives, which are valuable in the development of advanced materials with specific thermal and mechanical properties. Additionally, it finds application in the semiconductor industry, where it is utilized in chemical vapor deposition (CVD) processes to deposit thin films of silicon-containing compounds. These films are essential for manufacturing electronic devices, such as integrated circuits and solar cells. The compound’s reactivity also makes it suitable for use in surface modification and coating technologies, enhancing the performance and durability of various substrates.
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