Tris(Dimethylsilyl)Amine
95%
- Product Code: 88272
CAS:
21331-86-2
| Molecular Weight: | 191.497 g./mol | Molecular Formula: | C₆H₂₁NSi₃ |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD00053657 | |
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| Density: | Storage Condition: | 2~8℃,Seal |
Product Description:
Tris(dimethylsilyl)amine is widely used in the field of organometallic chemistry as a precursor for the synthesis of various silicon-nitrogen compounds. It serves as a key reagent in the preparation of silicon-based polymers and coatings, which are essential in creating materials with high thermal stability and resistance to oxidation. Additionally, it is employed in the deposition of silicon nitride films, a critical component in the semiconductor industry for manufacturing integrated circuits and microelectronic devices. Its ability to act as a silylating agent makes it valuable in organic synthesis, particularly in protecting groups and modifying surfaces to enhance their chemical properties.
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 1.000 | 10-20 days | ฿4,660.00 |
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Tris(Dimethylsilyl)Amine
Tris(dimethylsilyl)amine is widely used in the field of organometallic chemistry as a precursor for the synthesis of various silicon-nitrogen compounds. It serves as a key reagent in the preparation of silicon-based polymers and coatings, which are essential in creating materials with high thermal stability and resistance to oxidation. Additionally, it is employed in the deposition of silicon nitride films, a critical component in the semiconductor industry for manufacturing integrated circuits and microelectronic devices. Its ability to act as a silylating agent makes it valuable in organic synthesis, particularly in protecting groups and modifying surfaces to enhance their chemical properties.
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