BIS(DIMETHYLAMINO)METHYLSILANE
96%
- Product Code: 88401
CAS:
22705-33-5
| Molecular Weight: | 132.28 g./mol | Molecular Formula: | C₅H₁₆N₂Si |
|---|---|---|---|
| EC Number: | MDL Number: | ||
| Melting Point: | 0 °C | Boiling Point: | 112 °C |
| Density: | 0.798 g/mL at 20 °C(lit.) | Storage Condition: | 2-8°C, sealed, dry |
Product Description:
Used primarily in the semiconductor industry as a precursor for depositing silicon-containing thin films. It is applied in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes to create high-quality silicon nitride or silicon carbide layers, which are essential for manufacturing microelectronic devices. Additionally, it serves as a reagent in organic synthesis for introducing silicon-based functional groups into molecules, aiding in the development of advanced materials and coatings. Its role in surface modification and adhesion promotion is also notable in various industrial applications.
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 25.000 | 10-20 days | ฿28,800.00 |
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| 100.000 | 10-20 days | ฿93,600.00 |
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BIS(DIMETHYLAMINO)METHYLSILANE
Used primarily in the semiconductor industry as a precursor for depositing silicon-containing thin films. It is applied in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes to create high-quality silicon nitride or silicon carbide layers, which are essential for manufacturing microelectronic devices. Additionally, it serves as a reagent in organic synthesis for introducing silicon-based functional groups into molecules, aiding in the development of advanced materials and coatings. Its role in surface modification and adhesion promotion is also notable in various industrial applications.
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