Bis(dimethylamino)dimethylsilane
≥97%
- Product Code: 88519
CAS:
3768-58-9
Molecular Weight: | 146.31 g./mol | Molecular Formula: | C₆H₁₈N₂Si |
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EC Number: | MDL Number: | MFCD00008296 | |
Melting Point: | -98°C (Lit.) | Boiling Point: | 128-129°C (Lit.) |
Density: | Storage Condition: | 2~8℃, stored in inert gas |
Product Description:
Used primarily in the semiconductor industry as a precursor for chemical vapor deposition (CVD) processes to deposit silicon nitride and silicon carbide thin films. These films are essential for creating insulating layers and protective coatings in electronic devices. It is also employed in the production of silicones and as a surface modification agent to enhance the properties of materials like glass or metals. Additionally, it serves as a reagent in organic synthesis for introducing silicon-containing functional groups into molecules.
Sizes / Availability / Pricing:
Size (g) | Availability | Price | Quantity |
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25.000 | 10-20 days | ฿4,095.00 |
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100.000 | 10-20 days | ฿15,075.00 |
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Bis(dimethylamino)dimethylsilane
Used primarily in the semiconductor industry as a precursor for chemical vapor deposition (CVD) processes to deposit silicon nitride and silicon carbide thin films. These films are essential for creating insulating layers and protective coatings in electronic devices. It is also employed in the production of silicones and as a surface modification agent to enhance the properties of materials like glass or metals. Additionally, it serves as a reagent in organic synthesis for introducing silicon-containing functional groups into molecules.
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