TETRAKIS(TRIMETHYLSILOXY)TITANIUM
97%
- Product Code: 88549
CAS:
15990-66-6
Molecular Weight: | 404.62 g./mol | Molecular Formula: | C₁₂H₃₆O₄Si₄Ti |
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EC Number: | MDL Number: | MFCD00054762 | |
Melting Point: | 0 °C | Boiling Point: | 110 °C |
Density: | Storage Condition: | 2-8°C, sealed, dry |
Product Description:
TetraKIS(TRIMETHYLSILOXY)TITANIUM is widely used in the field of materials science for surface modification and coating applications. It serves as a precursor for depositing titanium-containing thin films, which are essential in enhancing the durability and resistance of various substrates. This compound is particularly valuable in the production of protective coatings for optical lenses, where it improves scratch resistance and anti-reflective properties. Additionally, it is utilized in the manufacturing of hydrophobic coatings, making surfaces water-repellent and self-cleaning. In the electronics industry, it plays a role in the fabrication of dielectric layers for semiconductors, contributing to improved performance and stability of electronic devices. Its versatility also extends to catalysis, where it is employed in organic synthesis reactions to facilitate the formation of complex molecules.
Sizes / Availability / Pricing:
Size (g) | Availability | Price | Quantity |
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25.000 | 10-20 days | $405.04 |
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100.000 | 10-20 days | $1,296.13 |
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TETRAKIS(TRIMETHYLSILOXY)TITANIUM
TetraKIS(TRIMETHYLSILOXY)TITANIUM is widely used in the field of materials science for surface modification and coating applications. It serves as a precursor for depositing titanium-containing thin films, which are essential in enhancing the durability and resistance of various substrates. This compound is particularly valuable in the production of protective coatings for optical lenses, where it improves scratch resistance and anti-reflective properties. Additionally, it is utilized in the manufacturing of hydrophobic coatings, making surfaces water-repellent and self-cleaning. In the electronics industry, it plays a role in the fabrication of dielectric layers for semiconductors, contributing to improved performance and stability of electronic devices. Its versatility also extends to catalysis, where it is employed in organic synthesis reactions to facilitate the formation of complex molecules.
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