Tetrakis(dimethylamino)silane
99%
- Product Code: 88553
CAS:
1624-01-7
| Molecular Weight: | 204.40 g./mol | Molecular Formula: | C₈H₂₄N₄Si |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD00014859 | |
| Melting Point: | Boiling Point: | ||
| Density: | Storage Condition: | Room temperature, airtight, dry |
Product Description:
Used primarily in the semiconductor industry as a precursor for silicon nitride and silicon dioxide thin films in chemical vapor deposition (CVD) processes. It plays a crucial role in the fabrication of microelectronic devices, ensuring high-quality, uniform layers essential for device performance. Additionally, it is employed in the production of optical coatings and as a surface modifier in various advanced materials. Its ability to deposit silicon-based films at relatively low temperatures makes it valuable for applications requiring precise control over film properties.
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 1.000 | 10-20 days | Ft69,816.22 |
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| 5.000 | 10-20 days | Ft299,530.98 |
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Tetrakis(dimethylamino)silane
Used primarily in the semiconductor industry as a precursor for silicon nitride and silicon dioxide thin films in chemical vapor deposition (CVD) processes. It plays a crucial role in the fabrication of microelectronic devices, ensuring high-quality, uniform layers essential for device performance. Additionally, it is employed in the production of optical coatings and as a surface modifier in various advanced materials. Its ability to deposit silicon-based films at relatively low temperatures makes it valuable for applications requiring precise control over film properties.
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