Tetrapropyl orthosilicate
97%
- Product Code: 88557
Alias:
Tetrapropoxysilane; Propyl Orthosilicate
CAS:
682-01-9
| Molecular Weight: | 264.43 g./mol | Molecular Formula: | C₁₂H₂₈O₄Si |
|---|---|---|---|
| EC Number: | 211-659-0 | MDL Number: | MFCD00009364 |
| Melting Point: | Boiling Point: | 94 °C5 mm Hg(lit.) | |
| Density: | 0.916 g/mL at 25 °C(lit.) | Storage Condition: | Room temperature, inert gas protection |
Product Description:
Tetrapropyl orthosilicate is widely used in the production of silica-based materials, particularly in the synthesis of zeolites and other porous structures. It serves as a precursor in sol-gel processes, where it helps create thin films, coatings, and nanoparticles with controlled porosity and surface properties. In the field of catalysis, it is employed to prepare catalysts and supports with high thermal stability and surface area, enhancing reaction efficiency. Additionally, it finds applications in the development of optical and electronic materials, where its ability to form uniform silica layers is crucial for device performance. It is also utilized in the fabrication of protective coatings for metals and ceramics, offering resistance to corrosion and wear.
Product Specification:
| Test | Specification |
|---|---|
| PurityGC | 97 100% |
| REFRACTIVE INDEX N20D | 1.4-1.402 |
| APPEARANCE | COLORLESS LIQUID |
| INFRARED SPECTRUM | Conforms to Structure |
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 25.000 | 10-20 days | ฿390.00 |
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| 100.000 | 10-20 days | ฿1,130.00 |
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| 500.000 | 10-20 days | ฿3,420.00 |
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| 2500.000 | 10-20 days | ฿14,980.00 |
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Tetrapropyl orthosilicate
Tetrapropyl orthosilicate is widely used in the production of silica-based materials, particularly in the synthesis of zeolites and other porous structures. It serves as a precursor in sol-gel processes, where it helps create thin films, coatings, and nanoparticles with controlled porosity and surface properties. In the field of catalysis, it is employed to prepare catalysts and supports with high thermal stability and surface area, enhancing reaction efficiency. Additionally, it finds applications in the development of optical and electronic materials, where its ability to form uniform silica layers is crucial for device performance. It is also utilized in the fabrication of protective coatings for metals and ceramics, offering resistance to corrosion and wear.
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