1,5-Cyclooctadiene(hexafluoro-2,4-pentanedionato)copper(I)

95.0%

  • Product Code: 88658
  Alias:    Hexafluoro-2,4-pentanedione-1,5-cyclooctadiene copper (I) complex; Hexafluoroacetylacetone-cyclooctadiene copper (I); 1,5-cyclooctadiene complex thing
  CAS:    86233-74-1
Molecular Weight: 378.77 g./mol Molecular Formula: C₁₃H₁₃CuF₆O₂
EC Number: MDL Number: MFCD00156517
Melting Point: 82-84°C Boiling Point: 60°C 0,1mm
Density: Storage Condition: room temperature
Product Description: This chemical is primarily utilized in the field of materials science, particularly in the deposition of thin films. It serves as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes, where it helps in the formation of copper-containing films on various substrates. These films are essential in the manufacturing of microelectronic devices, such as integrated circuits and semiconductors, due to copper's excellent electrical conductivity. Additionally, it is employed in the development of advanced coatings and nanomaterials, contributing to innovations in electronics, optics, and catalysis. Its stability and reactivity make it a valuable component in precise and controlled deposition processes.
Product Specification:
Test Specification
PURITYCHELOMETRIC TITRATION 95-100
INFRARED SPECTRUM Conforms to Structure
Sizes / Availability / Pricing:
Size (g) Availability Price Quantity
0.250 10-20 days $83.69
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1.000 10-20 days $293.76
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5.000 10-20 days $965.39
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1,5-Cyclooctadiene(hexafluoro-2,4-pentanedionato)copper(I)
This chemical is primarily utilized in the field of materials science, particularly in the deposition of thin films. It serves as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes, where it helps in the formation of copper-containing films on various substrates. These films are essential in the manufacturing of microelectronic devices, such as integrated circuits and semiconductors, due to copper's excellent electrical conductivity. Additionally, it is employed in the development of advanced coatings and nanomaterials, contributing to innovations in electronics, optics, and catalysis. Its stability and reactivity make it a valuable component in precise and controlled deposition processes.
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