Dimethylaluminum chloride
0.9 M in heptane , MkSeal
- Product Code: 88680
CAS:
1184-58-3
| Molecular Weight: | 92.50 g./mol | Molecular Formula: | CH₃₂AlCl |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD00000458 | |
| Melting Point: | -21°C | Boiling Point: | 126-127°C |
| Density: | 0.701 g/mL at 25 °C | Storage Condition: | 2~8 ℃ |
Product Description:
Dimethylaluminum chloride is widely used as a catalyst in organic synthesis, particularly in polymerization reactions. It plays a key role in the production of polyolefins, such as polyethylene and polypropylene, by initiating and controlling the polymerization process. Additionally, it is employed in the synthesis of fine chemicals and pharmaceuticals, where it acts as a reagent for alkylation and other transformations. In the electronics industry, it serves as a precursor for depositing aluminum-containing thin films in chemical vapor deposition (CVD) processes, which are essential for manufacturing semiconductors and other electronic components. Its strong Lewis acid properties also make it useful in various catalytic and stoichiometric reactions in research and industrial applications.
Product Specification:
| Test | Specification |
|---|---|
| APPEARANCE | Colorless to light yellow liquid |
| ASSAY | 0.80 M 1.00 M |
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 100.000 | 10-20 days | ฿8,990.00 |
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Dimethylaluminum chloride
Dimethylaluminum chloride is widely used as a catalyst in organic synthesis, particularly in polymerization reactions. It plays a key role in the production of polyolefins, such as polyethylene and polypropylene, by initiating and controlling the polymerization process. Additionally, it is employed in the synthesis of fine chemicals and pharmaceuticals, where it acts as a reagent for alkylation and other transformations. In the electronics industry, it serves as a precursor for depositing aluminum-containing thin films in chemical vapor deposition (CVD) processes, which are essential for manufacturing semiconductors and other electronic components. Its strong Lewis acid properties also make it useful in various catalytic and stoichiometric reactions in research and industrial applications.
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