Aluminum 2,4-Pentanedionate Bis(Ethylacetoacetate)
97%
- Product Code: 88693
CAS:
19443-16-4
| Molecular Weight: | 384.36 g./mol | Molecular Formula: | C₁₇H₂₆AlO₈ |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD04038104 | |
| Melting Point: | Boiling Point: | ||
| Density: | 1.13 g/cm3 at 25 °C (lit.) | Storage Condition: | room temperature |
Product Description:
This chemical is widely utilized in the production of thin films and coatings, particularly in the field of materials science. It serves as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes, enabling the creation of high-purity aluminum oxide films. These films are essential in manufacturing semiconductors, optical devices, and protective coatings for various surfaces. Additionally, it is employed in the synthesis of catalysts and as a cross-linking agent in polymer chemistry, enhancing the thermal and mechanical properties of materials. Its versatility makes it valuable in advanced industrial and research applications.
Product Specification:
| Test | Specification |
|---|---|
| APPEARANCE | Yellow Viscous Liquid |
| PURITY | 96.5-100 |
| Infrared spectrum | Conforms to Structure |
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 5.000 | 10-20 days | ฿4,560.00 |
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| 25.000 | 10-20 days | ฿19,600.00 |
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Aluminum 2,4-Pentanedionate Bis(Ethylacetoacetate)
This chemical is widely utilized in the production of thin films and coatings, particularly in the field of materials science. It serves as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes, enabling the creation of high-purity aluminum oxide films. These films are essential in manufacturing semiconductors, optical devices, and protective coatings for various surfaces. Additionally, it is employed in the synthesis of catalysts and as a cross-linking agent in polymer chemistry, enhancing the thermal and mechanical properties of materials. Its versatility makes it valuable in advanced industrial and research applications.
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